Degree
Master of Engineering Science
Program
Mechanical and Materials Engineering
Supervisor
Dr. Andy Xueliang Sun
Abstract
Recent research has evidenced that nanotechnology may bring about a material revolution which sweeps through different scientific fields and leads to dramatic changes in the use of natural resources and our everyday life. Compared to their bulk counterparts, the nanomaterials may exhibit significantly improved physical properties by shrinking their size to nanometer scale. Metal silicide are distinguished by their features of combining advantages of both metals and semiconductors which promises superior performance various fields. Despite the progress in the synthesis methods of nanomaterials, it still remains a big challenge in controlled synthesis of 1D silicide nanostructures due to the difficulties of well-controlled synthesis conditions.
In this study, synthesis process of NiSix and CoSix with different morphologies using CVD method have been analysed and determined. Synthesis of different structures of NiSix on a number of substrates has been investigated. The mechanisms behind the growth of these nanostructures have been studied for better understanding of the synthesis of these silicides. The detailed characterization techniques such as SEM, TEM and XRD were used.
Recommended Citation
Norouzi Banis, Hamid, "Synthesis of silicide nanomaterials using chemical vapour deposition method" (2012). Electronic Thesis and Dissertation Repository. 767.
https://ir.lib.uwo.ca/etd/767