Electrical and Computer Engineering Publications
Optimization of protocrystalline silicon p-type layers for amorphous silicon n-i-p solar cells
Document Type
Conference Proceeding
Publication Date
6-15-2004
Volume
338-340
Issue
1 SPEC. ISS.
Journal
Journal of Non-Crystalline Solids
First Page
694
URL with Digital Object Identifier
10.1016/j.jnoncrysol.2004.03.062
Last Page
697
Abstract
Real time spectroscopic ellipsometry has been applied to develop deposition phase diagrams for p-type hydrogenated silicon (Si:H) films prepared at low temperature (200 °C) by rf plasma-enhanced chemical vapor deposition using gas mixtures of SiH4, H2, and BF3. These diagrams depict the regimes of accumulated thickness and H2-dilution ratio R = [H2]/[SiH4] within which p-type amorphous Si:H [a-Si:H], mixed-phase Si:H [(a+μc)-Si:H], and single-phase microcrystalline Si:H [μc-Si:H] films are obtained in depositions on R = 0 a-Si:H surfaces. The performance of n-i-p solar cells incorporating p-layers deposited under the same conditions as those used in the phase diagram development has been correlated with the deduced p-layer characteristics. This correlation demonstrates that Voc is maximized when the highest possible R value is used for the p-layer while ensuring single-phase amorphous film growth throughout its thickness. © 2004 Elsevier B.V. All rights reserved.