Micromorphology analysis of sputtered indium tin oxide fabricated with variable ambient combinations

Authors

Ţălu, Technical University of Cluj-Napoca
Slawomir Kulesza, Uniwersytet Warminsko-Mazurski w Olsztynie
Miroslaw Bramowicz, Uniwersytet Warminsko-Mazurski w Olsztynie
Adam M. Pringle, Michigan Technological University
Joshua M. Pearce, Michigan Technological UniversityFollow
Marikkan Murugesan, Madurai Kamaraj University
Vishnukanthan Venkatachalapathy, Universitetet i Oslo
J. Mayandi, Madurai Kamaraj University

Document Type

Article

Publication Date

6-1-2018

Volume

220

Journal

Materials Letters

First Page

169

URL with Digital Object Identifier

10.1016/j.matlet.2018.03.005

Last Page

171

Abstract

This study experimentally investigates the fractal nature of DC magnetron sputtered indium-tin oxide (ITO) fabricated utilizing mixed ambient combinations and post-annealed at 450 °C in air towards solar cell applications. The structural properties of the films were examined by X-ray diffraction technique. In addition, three-dimensional (3-D) surface morphology of the films was analyzed using the areal autocorrelation function and pseudo-topothesy K for the atomic force microscopy images. The fractal nature of films was co-related with respect to electrical and optical properties of ITO films prepared under five different ambient conditions.